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Article:   Algorithm to Derive Optimal Mask and Movement Patterns in Moving Mask Deep X-ray Lithography (M2DXL)

Journal:   電気学会論文誌Ｅ（センサ・マイクロマシン部門誌）   [1341-8939]

Author:   Naoki Matsuzuka
Year:  2005     Volume:  125     Issue:  5     Pages:  222 - 228

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